Multicrystalline silicon production furnace|Dai-ichi kiden, expert of high-frequency induction heating and hot press, induction heating apparatus

  1. HOME > 
  2. Product > 
  3. Crystal growth > 
  4. Multicrystalline silicon production furnace

Product

Multicrystalline silicon production furnace

Fully controlled by PC

Screen configuration

Compact furnace (patent pending)

Low running costs,
excellent safety controls

MSF-690C / MSF-840C

Description

Dai-ichi Kiden leading-edge technology brings economical feature to silicon production

Multicrystalline silicon production systems for producing crystals for solar cells.


※ MSF-690C, small polycrystalline silicon coagulation growing system and MSF-180C for R&D use are also available.

Feature

  • Fully controlled, screen configuration by PC (5 different interfaces)
  • Compact furnace (patent pending)
  • Low running cost
  • Features excellent safety

Specification

Maximum charging size of the silicon 840x840×250(mm)
Growing time 60~70h
Boule weight 420kg
Heating temperature Max 1700℃、operating temp.1600℃ (carbon heater)
Furnace pressure Air~depressurization
Atmosphere

Ar gas 1~50L/min、Pressure 0.2Mpa 50L/min

Power supply 3-phase AC、400/440V、50/60HZ Common use、300KVA
Refractory Molding insulation material (carbon material)

Cooling water

Pressure 0.3MPa、flow rate 400L/min、temperature 35℃ or less
Air 0.5MPa or more
Chamber Water-cooled double structure

|   Crystal growth   |

Contact

Please feel free to contact us if you have any questions.

042-488-3312

Reception time 09:00~17:30

Contact us by e-mail

PAGE TOP