Advanced crystal growth systems
backed by decades of experience
We offer crystal growth equipment designed to support a wide range of crystal growth methods.
Our systems enable high-quality crystal growth for various applications, including semiconductor and electronic materials as well as photovoltaic fields.
From research and development to mass production, our equipment can be configured to meet specific processes and objectives, allowing optimal system selection for your requirements.
Features
- Supports a wide range of growth methods (CZ, Bridgman, EFG, etc.)
- Capable of growing high-quality single crystals and polycrystals
- Suitable for applications from R&D to mass production
MSG crystal growth system
Rapid thermal annealing apparatus (RTA furnace)
Bulk cultivatable sublimation apparatus
Liquid phase epitaxial system (LPE method)
Compact Bridgman furnace
Bridgman furnace
Door chamber pulling system (CZ method)
High-frequency heating μ-PD furnace
Resistance heating type μ-PD furnace
Edge-defined film-fed growth apparatus (EFG furnace)
Resistance heating type pulling system (CZ method)
Small-Chamber Lifting Device (CZ Method)
Round chamber pulling system (CZ method)
Solution growth method single crystal growing apparatus (TSSG method)
